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Phosphorous Diffusion is used in the manufacture of solar cells. Silicon wafers are doped with phosphoric acid to create the n-junction of the solar cell. This process is accomplished by depositing phosphorous vapor or coating to a silicon substrate. It is fired at temperatures between 800oC and 1000oC to drive the phosphorous into the silicon. Thus, creating the n-junction.
This application is typically processed in either a batch tube furnace or an in-line continuous furnace.
The in-line approach offers far greater throughput opportunity than the batch process.
BTU’s integrated In-Line Diffusion System combines the flagship TFQ Series Quartz Lined Diffusion Furnace with a Phosphorus coater that processes up to 1,500 wafers per hour.
The excellent thermal uniformity produces very predictable and repeatable sheet resistance values, configurable from 40 to 80 ohms/sq.
The quartz lining creates a metal-free process tunnel that eliminates the reaction with phosphoric acid.
PRODUCTS:
Meridian In-Line Diffusion System
• Meridian Diffusion Furnace
Metallization
• Anti Reflective Coating
PROCESS:
Diffusion
• Metallization
• Anti Reflective Coating
• Thin Film
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